Semi-Automatic Silicon Cleaning Equipment

Features

Suitable for semiconductor cleaning from 2" to 8". It removes organics, grain metal debris, natural oxidized layer, plastic etc. contaminant without destroying the silicon surface characteristic. Cleaning unit its configured according to different cleaning processing with standalone control for each part and customized combination. It support to a series of wide optional equipments, which include Nitrogen gun, DI watergun, constant temperature control, heating table, ultrasonic cleaning. ID water real-time heating, DI water-electric conductance testing device etc. The equipment has a practical and good looking casing and a small footage at the same time.
Customer customization.

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